Preparation of silicon wafer having optical waveguide film


PURPOSE:To enable formation of an electronic element on a substrate on which an optical circuit element has been formed without being restricted in relation to the process by retarding diffusion of dopant to the silicon substrate side by providing a diffusion inhibiting layer. CONSTITUTION:An inhibiting layer 2 for diffusion of dopant comprising SiO2 film is formed by oxidizing thermally the surface of a silicon wafer 1. The silicon wafer is a P type CZ wafer having (100) face bearings and 9OMEGA-cm resistivity. The thermal oxidation is carried out in dry CO2 atmosphere at 1,000 deg.C and the thickness of the SiO2 film is regulated to ca 1,000Angstrom . Succeedingly, gaseous starting material for forming glass consisting primarily of SiCl4 contg. appropriate amt. of GeCl4, BCl3, PCl3 as dopant is converted to fine glass particles by the frame hydrolysis of the gaseous starting material to deposit film 3 of fine glass particles having ca. 700mum thickness, which is heated in an electric furnace (in oxidizing atmosphere) to 1,150 deg.C and held for 2hr to vitrify the fine glass particle film 3 to transparent glass. Thus, optical waveguide film 4 is obtd. on the silicon wafer 1.




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Patent Citations (1)

    Publication numberPublication dateAssigneeTitle
    JP-S57202506-ADecember 11, 1982Nippon Sheet Glass Co LtdOptical circuit and its production

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    EP-1209493-A1May 29, 2002Shin-Etsu Chemical Co., Ltd.An optical waveguide and a method for producing it
    GB-2362963-ADecember 05, 2001Univ GlasgowWaveguide for an optical circuit and method of fabrication thereof
    GB-2362963-BMarch 12, 2003Univ GlasgowWaveguide for an optical circuit and method of fabrication thereof
    JP-H02253205-AOctober 12, 1990Sumitomo Electric Ind LtdOptical circuit
    JP-H05232335-ASeptember 10, 1993Hitachi Cable Ltd, 日立電線株式会社Production of glass waveguide
    JP-H0798420-AApril 11, 1995Hitachi Cable Ltd, 日立電線株式会社Production of optical waveguide
    JP-S6366511-AMarch 25, 1988Fujitsu LtdProduction of quartz optical waveguide
    US-4927781-AMay 22, 1990Miller Robert OMethod of making a silicon integrated circuit waveguide
    US-6735370-B1May 11, 2004The University Court Of The University Of GlasgowWaveguide for an optical circuit and method of fabrication thereof
    WO-0046618-A1August 10, 2000The University Court Of The University Of GlasgowGuide d'ondes pour un circuit optique et son procede de fabrication